Super-Resolution Microscopy Breaks New Ground in Semiconductor Imaging
LIG Nanowise has introduced the Super-resolution Microscopy Assisted Lens (SMAL) on its Nanoro platform, achieving a significant breakthrough in semiconductor inspection technology.
The SMAL lens successfully resolved features down to 80 nm on an Intel i5 processor, a result confirmed by scanning electron microscope (SEM).
Performance and Mode Enhancements
The DRY SMAL lens, deployed on both the Nanoro M and Nanoro Generation systems, consistently delivered 80 nm feature resolution. Using Blue Mode on the Nanoro Generation system further increased this resolution, pushing the boundaries of optical imaging for chip analysis.
Comparative Advantage
A direct comparison between the Nanoro Generation with DRY SMAL lens in Blue Mode and a conventional 100x objective lens revealed a stark contrast. The SMAL lens provided significantly higher detail and contrast, enabling inspection capabilities previously unattainable with standard optics.
Speed and Software Integration
The Nanoro software platform is designed for efficiency, enabling high-resolution scans in just minutes. It also includes integrated measurement tools, allowing for immediate feature quantification without the need for external analysis software.
Bridging the Imaging Gap
This technology is positioned to bridge the gap between optical and electron microscopy. It offers SEM-like resolution without complex sample preparation, delivers faster acquisition times, and provides built-in analysis tools. This combination makes it highly relevant for semiconductor research, materials science, and advanced manufacturing.